Towards Predictive TCAD and Fab Integration

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This paper gives an overview of the status of technology computer-aided design (TCAD) as it is used today for research, development and manufacturing projects in the micro- and opto-electronics industry. While the accurate and physics-based simulation of process steps for ultra-scaled silicon technologies is still an area of active research, the simulation of electrical and optical effects has reached a high level of maturity for both Si and non-Si devices.

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Journal: TechConnect Briefs
Volume: 1, Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Published: March 19, 2001
Pages: 1 - 4
Industry sector: Sensors, MEMS, Electronics
Topics: Modeling & Simulation of Microsystems
ISBN: 0-9708275-0-4