A novel plasma-based nanoparticle synthesis method using high power pulses has been developed. A high power pulse similar to high power impulse magnetron sputtering is applied to a cylindrical hollow cathode leading to a high degree of ionization of the sputtered material. Nanoparticles are synthesized from a copper hollow cathode and their size is studied with respect to the applied pulse parameters, i.e., frequency, pulse width and peak current. It is observed that all of these parameters can be used to alter the size distribution in the range of 10 to 40 nm. Nanoparticles were deposited on conducting as well as non-conducting substrates, and it was possible to obtain an even distribution of nanoparticles over the substrate without significant agglomeration.
Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2012: Advanced Materials, CNTs, Particles, Films and Composites (Volume 1)
Published: June 18, 2012
Pages: 371 - 373
Industry sector: Advanced Materials & Manufacturing
Topics: Nanoparticle Synthesis & Applications