Rapid Deposition of Graphene Layers in MxRAM Devices


Keywords: , , , , ,

A novel, scalable method is presented for depositing ultra-thin micro/nano-coatings to 20 nm, or particles < 2m/min. A lab bench process tool based on this technique was built and is shown, applied to the challenge of depositing Graphene layers as the Hall Effect sense element for MxRAM devices, here a novel, rad hard Magnetic Graphene-sense Random Access Memory (MGRAM) device. Current deposition technologies are briefly reviewed as incapable of the depositing the needed layers, a challenge identical as with TCO in attempting to spread Graphene, CNTs or conductive nanowires as ultra-thin layers over large areas. The demonstrated method is described, a fluid dynamical way of automatically forming LB films in which particles are made to self-assemble on the surface of a moving carrier fluid, forming a bi-layer, and can then be smoothly transferred onto a passing web (substrate). The technique avoids the problematic evaporation (drying) steps otherwise used by other ambient processes to reduce a deposited film to desired thinness or to form a monolayer.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2013: Advanced Materials, CNTs, Particles, Films and Composites (Volume 1)
Published: May 12, 2013
Pages: 760 - 763
Industry sector: Advanced Materials & Manufacturing
Topic: Advanced Manufacturing
ISBN: 978-1-4822-0581-7