NanoSpray Combustion Processing technology is a flame based open atmosphere process for nanostructured thin film manufacturing through the Combustion Chemical Vapor Deposition (CCVD) mode. The main advantage of NanoSpraySM CCVD technique includes using inexpensive and environmentally friendly precursors, no costly furnaces, vacuum equipment, and reaction chambers needed, scale up for continuous production, straightforward integration to existing production lines, and non-line-of-sight process with high degree control on composition, microstructure, and coverage area. By adjusting process parameters as well as solution concentrations and constituents, the NanoSpray CCVD technology has produced many nanostructured thin films with different structures for various applications, including epitaxial dielectric thin films, smooth and dense hard thin films, columnar microstructure with high surface area, multilayer corrosion resistant thin films, and nanocomposite thin films with metal nanoparticles embedded in glass matrix, to name a few. The NanoSpraySM CCVD technology can be on a wide range of substrates including ceramics, metals, glass, and plastics with complex shapes of virtually any size. Due to its intrinsic simplicity and flexibility, the NanoSpray CCVD technology enables accelerated development for new nanomaterials and applications.
Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2013: Advanced Materials, CNTs, Particles, Films and Composites (Volume 1)
Published: May 12, 2013
Pages: 764 - 767
Industry sector: Advanced Materials & Manufacturing
Topic: Advanced Manufacturing