Prevention of Coalescence Stage from Nuclei at Initial Growth of Thin Film by Substrate Rotation in Physical Vapour Deposition

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A method of nanoparticle fabrication in physical vapor deposition was introduced. Metal were deposited on the powdery substrate which were stirred by rotors. Particle size and prodcuction rate of metal nano particles were controlled by types of substrate, rotation speed of the substrate and evaporation rate of the metal in order to form well distribute nano particles(1-10nm). Nucleation phenomena on the substrate is examined by SEM, TEM, XPS, UV spectra, conductivity measurment, etc. Current industrial applications, comparision with conventional methods, prodcution yield, etc. are discussed.

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Journal: TechConnect Briefs
Volume: 4, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
Published: May 20, 2007
Pages: 265 - 268
Industry sector: Advanced Materials & Manufacturing
Topics: Nanoparticle Synthesis & Applications
ISBN: 1-4200-6376-6