Nanoporous thin film fabrication via magnetron sputtering and O2 plasma ashing process

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We report a new method of fabricating nanoporous catalytic thin films. In the first step, metal–carbon thin films were prepared by reactive magnetron sputtering, using various metallic targets (Au, Ag, Pt, Cu, Ni, Ti) as the metal sources and CH4 gas as the carbon source. The metal–carbon films were then oxidized by an oxygen plasma with a gas mixture of Ar and O2, and nanoporous metallic (Au, Ag, Pt) or metal–oxide (Cu, Ni, Ti) films were obtained by removing the carbon atoms from the metal–carbon thin films. Depending on the film composition, the calculated porosity varied from 50% to 90%.

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Journal: TechConnect Briefs
Volume: 2, Materials for Energy, Efficiency and Sustainability: TechConnect Briefs 2018
Published: May 13, 2018
Pages: 13 - 16
Industry sectors: Advanced Materials & Manufacturing | Energy & Sustainability
Topic: Catalysis
ISBN: 978-0-9975117-9-6