Molecular Vapor Deposition (MVDTM) techniques and equipment have been successfully used for many coating applications in the MEMS, disk drive, and nano-imprint lithography fields. By exploiting the ability of MVD to deposit an in-situ metal oxide “adhesion layer,” functional organic layers (hydrophobic, hydrophilic, reactive, etc.) can be attached to a variety of different substrate materials. The novelty of the MVD process is its ability to create these high quality metal oxide adhesion layers on low temperature substrates. This allows for functional coatings to be applied on plastics, polymers, fibers and other materials that can’t tolerate high temperatures. Metal oxides are desirable because they have better mechanical and dielectric properties than organo-silanes. The MVD technique has also been used to create nano-laminates by alternating sequential deposition of a metal oxide and a perfluorinated organic compound. Moreover, the refractive indexes of thin vapor deposited metal oxide films can be tuned for various optical applications.
Journal: TechConnect Briefs
Volume: 4, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
Published: May 20, 2007
Pages: 575 - 577
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Manufacturing, Nanoelectronics