A Novel Method of Fabricating Optical Gratings Using the One Step DRIE Process on SOI Wafers

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This paper describes a novel technique for manufacturing optical gratings by using the one step DRIE (Deep Reactive Ion Etching) process. Using the notching effect documented in previous work when working with silicon on insulator (SOI) wafers, fully released intact gratings have now been produced.

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Journal: TechConnect Briefs
Volume: 2, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Published: May 8, 2005
Pages: 508 - 510
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topic: MEMS & NEMS Devices, Modeling & Applications
ISBN: 0-9767985-1-4