Kim K., Park I-S, Won T.
Inha University, KR
Keywords: double gate MOSFET, short channel effect
We propose a novel device structure (Si1-xGex/Si/Si1-xGex hetero-structure), which is called “center-channel (CC) double-gate (DG) MOSFET, ”. The device performance of the proposed FET structure was investigated with our two-dimensional quantum-mechanical simulator which is based upon the self-consistent solution of Poisson-Schrödinger equations and the current continuity equation [1]. The CC operation of CC-NMOS is confirmed by considering the band lineups as well as the lowest energy wave function. Especially, the lowest energy wave function of CC-MOSFET is carefully compared with those of the conventional DG-NMOS in order to observe the distinct feature of the proposed FET structure. Furthermore, device optimization for the CC operation and short-channel effects (SCE) was performed in terms of Ge concentration, gate length (Lg), and Si1-xGex/Si/Si1-xGex scale variation.
Journal: TechConnect Briefs
Volume: 3, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3
Published: May 8, 2005
Pages: 87 - 90
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 0-9767985-2-2