plasma – Page 3 – TechConnect Briefs

Electrical Property of Fullerene Films Polymerized by Argon Plasma Treatment

Maruyama R., Sony Corporation, JP

Fullerene (C60) is a promising material for nano-carbon device research. Control of the electrical property of C60 is necessary for applications. C60 polymer has great promise because its unique structure allows its electrical and optical [...]

Alignment Characteristic and Mechanism of Carbon Nanotubes Synthesized by Hot Filament Chemical Vapor Deposition in a CH4/H2 Plasma

Yang Q., Chen W., Singh A., Xiao C., Hirose A., University of Saskatchewan, CA

Controlling of the alignment of carbon nanotubes (CNTs) is very important for applications such as scanning probes, sensors, field emitters and nanoelectronics. Controlled growth of CNTs aligned at different angles to the substrate has been [...]

Process for Extremely Thin Silicon-on-Insulator Wafer

Usenko A.Y., Carr W.N., Chen B., Silicon Wafer Technologies, Inc., US

We observe hydrogen platelets buildup into single crystalline silicon caused by hydrogen plasma processing. The platelets are aligned along a layer of lattice defects formed in silicon before plasma processing. The buried defect layer is [...]

Nanoworld Semiconductor Industry – State and Future Challenges of Technology Computer Aided Design

Puchner H., Cypress Semiconductor, US

Several application examples of nanoscale techniques used to influence or enhance the understanding of material properties as well as processing behavior are presented. We will also present a review of first principle density functional theory [...]

Nanoworld Semiconductor Industry – State and Future Challenges of Technology Computer Aided Design

Puchner H., Cypress Semiconductor, US

Several application examples of nanoscale techniques used to influence or enhance the understanding of material properties as well as processing behavior are presented. We will also present a review of first principle density functional theory [...]