Resist Mask Designs for Quantum Dot Transistor Using E-Beam Nanolithography
Hashim U., Sutikno S., Jamal Z.A.Z., Northern Malaysia University College of Engineering (KUKUM), MY
Quantum dot single electron transistor (QD SET) can be fabricated using e-beam nanolithography (EBL) and then continued by combination process of pattern dependent oxidation (PADOX) and high density plasma etching. EBL was used to pattern [...]