amorphous silicon – TechConnect Briefs

Three-Dimensional High-order Nano-rod Formation Using a Hydrogen-assisted Deep Reactive Ion Etching

Soleimani S., Zanganeh S., Azimi S., Sanaee Z., Mohajerzadeh S., Taghinejad H., University of Tehran, IR

We report the formation of three-dimensional nano-sized vertical features on amorphous silicon by means of a hydrogen-assisted deep reactive ion etching. The thickness of amorphous silicon has been varied between 5 and 10 µm. The [...]

Optical absorption enhancement of thin-film amorphous silicon induced by femtosecond laser pulses for solar cell fabrication

Kiani A., Venkatakrishnan K., Tan B., Ryerson University, CA

In this paper, we present a new method for direct-write laser fabrication of thin-film amorphous silicon (a-Si) on crystalline silicon substrate induced by femtosecond laser irradiation. Using megahertz frequency femtosecond laser pulses makes it possible [...]

Optical absorption enhancement of thin-film amorphous silicon induced by femtosecond laser pulses for solar cell fabrication

Kiani A., Venkatakrishnan K., Tan B., Ryerson University, CA

In this paper, we present a new method for direct-write laser fabrication of thin-film amorphous silicon (a-Si) on crystalline silicon substrate induced by femtosecond laser irradiation. Using megahertz frequency femtosecond laser pulses makes it possible [...]

Mechanical Robustness of FPA in a-Si Microbolometer with Fine Pitch

Kim B.I., Kim H-Y, Kim K-M, Kim T-H., Kim B.I., Kim H-Y, Kim K-M, Kim T-H., Kim B.I., Kim H-Y, Kim K-M, Kim T-H., Jang W.S., Kim B.I., Kim H-Y, Kim K-M, Kim T-H., Kang T.Y., National Nanofab Center, KR

Uncooled microbolometer has the various applications in many commercial and military applications. Among many sensor materials, amorphous Si have been widely used as sensor materials for their good TCR (Temperature Coefficient of Resistance), mechanical strength, [...]

Maskless Lithography Using Patterned Amorphous Silicon Layer Induced by Femtosecond Laser Irradiation

Kiani A., Venkatakrishnan K., Tan B., Ryerson University, CA

In this research, we reported a maskless lithography method by a combination of laser amorphization of silicon and wet alkaline etching. This technique can lead to a promising solution for maskless lithography because in comparison [...]

Nanoscale Control of Light-induced Degradation in Amorphous Silicon

Shirai K., Yamazaki Y., Katayama-Yoshida H., ISIR, Osaka University, JP

The major problem of amorphous silicon solar cell is the light-induced degration. A recent experiment shows that this problem may be solved by a CN treatment. In this paper, microscopic mechanism of this CN treatment [...]

Tunneling-Assisted Currents in n+p+ Amorphous Silicon Junctions

Furlan J., Gorup Z., University of Ljubljana, SI

A theoretical model for the tunneling transport of charge carriers in forward-biased heavily doped amorphous silicon pn junctions was recently presented. In this paper, in addition to current-voltage characteristics in the forward direction, reverse-voltage characteristics [...]

Modelling High Built-In Electric Field Effects on Generation-Recombination Rates in Space-Charge Regions of pn a-Si:H Junctions

Furlan J., Gorup Z., Smole F., Topic M., University of Ljublijana, SI

A theoretical model of lateral transport of charge carriers in pn a-Si:H junctions with high built-in electric fields is proposed in which the transport of carriers is treated in a similar way to capture-emission transitions [...]