3D Nanostructured Silicon Relying on Hard Mask Engineering for High Temperature Annealing (HME-HTA) Processes for Electronic Devices
Bopp M., Coronel P., Judong F., Jouannic K., Talbot A., Ristoiu D., Pribat C., Bardos N., Pico F., Samson M.P., Dainesi P., Ionescu A.M., Skotnicki T., Ecole Polytechnique Fédérale de Lausanne, CH
Annealing silicon at high temperatures in hydrogen ambiance has been reported to induce surface diffusion of silicon; in these conditions, adapted 2D arrays of trenches etched in Bulk Si are transformed into buried cavities creating [...]