Guided Self-Assembly of Block-Copolymer Nanostructures
Karim A., Berry B.C., Kim H-C, Kim S., Zhang X., Bosse A.W., Lacerda S.H., Yager K.G., Jones R.L., Douglas J.F., Briber R.M., Kim H-C, Kim S., NIST, US
A primary limitation of block copolymer films as templates for next generation electronic or data storage devices is the prohibitively long times required for thermally driven self-assembly and defect annihilation and long range order development. [...]