Advanced large scale colloidal lithography for sub-100 nm direct and indirect nanostructuring: application to silicon and metals
Kadiri H., Faustini M., Turover D., Grosso D., Gokarna A., Lerondel G., Université de Technologie de Troyes, FR
Actually nano-sphere lithography is a great technique to fabricate structures at large scale, therefore using self-assembly as a bottom-up approach nano scale materials. In this study, combining Reactive Ion Etching(RIE) and polystyrene(PS) nano-sphere lithography we [...]