Modeling & Simulation of Microsystems – Page 53

Towards Microelectrofluidic System (MEFS) Computing and Architecture

Dewey A., Fair R.B., Jopling J., Ding J., Zhang T., Cao F., Schreiner B., Pollack M., Duke University, US

This paper presents the rationale, design, and simulation of next-generation microelectro fluidic system computational architectures for the emerging field of bioinformatics. Current microelectro fluidic processors (e.g. biochips) have largely dedicated architectures supporting relatively specialized applications. [...]

Methodology of Macromodeling Demonstrated on Force Feedback S/D-Architectures

Hardtmann M., Aigner R., Nadal R., Wachutka G., Münich University of Technology, DE

Design and verification of complete microsystems require effective models of the micromechanical components for the simulation at system level. Particularly for force feedback S/D-architectures, long transient simulations are inevitable to characterize the system-inherent signal pro-cessing. [...]

Compact MEMS Modeling for Design Studies

Voigt P., Wachutka G., University of Technology, DE

A method for MEMS macromodel development is presented which is based on a physical device description to obrain mathematical relations for the device operation. Since design and technlogy parameters are input parameters of the resulting [...]

System Level Simulation of an Electrostatically Levitated Disk

Kraft M., Evans A., University of Southampton, UK

This paper describes the derivation of a system-level model for a micromachined disk which is levitated by electrostatic forces. Such a system has many potential applications for inertial sensors, micro-motors, microfluidic and micro-optical devices. As [...]

System-Level Modeling and Simulation of MEMS

Computer Simulation from Electron Beam Lithography to Optical Lithography

Cui Z., Rutherford Appleton Laboratory, UK

Simulation of electron beam lithography and optical lithography has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulation which was based on ideal [...]

Self-Adapting Vertices for Mask-Layout Synthesis

Lee C.-Y., Antonsson E.K., California Institute of Technology, US

An efficient procedure for synthesizing MEMS mask-layouts for a desired 3-D shape is discussed. This method can greatly reduce the number of design and prototype iterations required to produce a desired device. The method is [...]

Modeling of Focused Ion Beam Trimming of Cantilever Beams

Lam T., Darling R.B., Univeristy of Washington, US

A finite element model of the cantilever beam is implemented to include a non-uniform thickness along its length, due to focused ion beam trimming. A quasi-static, iterative approach is used to calculate the cantilever profile [...]

Pre-Physical Design Analysis and Optimization of Repeaters Based on Technology Node, Materials, Devices, and Repeater Options

Lynch W.T., Independent Consultant, US

For the first time a comprehensive methodology has been applied to the pre-physical design of hierarchical interconnect wiring with consideration of the limitations of both the device and the wiring technologies (Fig. 1). The overall [...]

Modeling the Microstructure and Elastic Properties of Complex Materials

Roberts A.P., Garboczi E.J., University of Queensland, AU

The finite element method is used to study the influence of porosity and pore shape on the elastic properties of model porous media. The Young's modulus of each model was found to be practically independent [...]