Sensors, MEMS, Electronics – Page 75

Computer Simulations and Experimental Study of Graphane-Like Materials Produced by Electrolytic Hydrogenation

Ilyin A.M., Nemkaeva R.R., Guseinov N.R., Tsyganov I.A., Beall G.W., Kazakh National University, KZ

Graphane and graphane-like materials in spite of their recent origin [1,2] are objects of great interest for many researchers, because of very wide field of their potential applicability: hydrogen energetic, electronics, materials science etc. The [...]

Direct Manufacturing of Functional Structures on 3D microscale surfaces by Laser Dynamic Forming

Huang G., Cheng G.J., Purdue University, US

This paper demonstrates a scalable and fast-shaping top-down integration technique, Laser Dynamic Forming (LDF), capable of manufacturing 3D functional structures conformal to micro-to-mesoscale curvilinear features on various substrates by the laser-induced shockwave. The functional devices [...]

A novel cyclic forward-backward extrusion process for production of ultrafine grains materials

Alihosseini H., Asle Zaeem M., Dehghani K., Mississippi State Univeristy, US

A new cyclic forward-backward extrusion (CFBE) process was introduced as a severe plastic deformation (SPD) technique to produce ultrafine-grained aluminum rods. According to transmission electron microscopy (TEM) and electron backscatter diffraction (EBSD) results, the average [...]

A study of the Demolding Force in Nano Imprint Lithography For Different Surface Treatments

Moon S.N., Jung J-M, Lee K.M., Lee W.I., Lee K.M., Lee W.I., Seoul National University, KR

The NIL process can be divided into two steps: the pressing and demolding stages. In the pressing stage, micro/nano scale patterns on a mold are transferred to a polymer resist. During this stage, there are [...]

A new method for vertical growth of silicon nanowire in the vapor-liquid-solid (VLS) process

Kim Y.J., Suh D., Lee M.L., Ryu H., Electronics and Telecommunications Research Institute (ETRI), KR

We present a new facile method for vertical growth of the silicon nanowire (Si NW) that obviates the need for SiCl4 in vapor-liquid-solid (VLS) process. The VLS process that involves SiCl4 has two major disadvantages; [...]

Tunable-Linewidth Nanoimprint Working Stamps Fabricated by Double Oblique Metal Deposition

Lin C.H., Wu C-L, Sung C.K., National Tsing Hua University, TW

This paper proposes a low cost but rapid methodology for fabricating working stamps with tunable line-width or pitch structures. Conventionally, the master stamp for nanoimprint lithograph (NIL) is made of silicon by e-beam lithography, which [...]

Synthesis of silicon nanoparticles by picosecond laser ablation in liquid

Popovic D.M., University of Belgrade-Faculty of Physics, RS

The one of the most promising method for the producing of silicon-based NPs is the laser ablation of solid target in liquid (LAL), because it’s relatively simple, fast and “green”. In this work we produced [...]

Standards of length at the nanoscale based on movement gages and their measurement with sub-nanometric uncertainty

Luskinovich P.N., Zhabotinsky V.A., Lubashevsky I.A., NANOMETER Standard GmbH, DE

The manufacture of nano-electronic devices, nano manipulators, and microelectromechanical sensors, as well as elaborations of nano-technological processes with atomic spatial resolution have made it necessary to calibrate measuring devices at the nanoscale with sub-nanometric error. [...]

Mechanical fabrication of graphene devices using focused-ion beam: deposition and milling

Lei N., Chen Z., Kim D., Xue W., Xu J., Xue W., Washington State University, US

The inherent difficulties in handling and producing graphene have been a major barrier in developing such devices. Conventional microfabrication methods are mostly based on chemical etching processes, which often involve tedious masking and aligning steps. [...]

Multiple surfaces pretreatments of nanoporous SiO2-based dielectric layers for electroless plating of copper

Chen G.S., Feng Chia University, TW

In this work, Black Diamond II (DB II with a chemical formula of SiOC:H), a leading nanoporous chemically vapor deposited dielectric layer, is examined as a test case for the SiO2-derived nanoporous IMDs, demonstrating the [...]