In this work, X-ray photoelectron spectroscopy (XPS) is used to study the annealing effects on the chemical structures, depth profiling of the chemical states and core-level shifts of the Si nanocrystals in the Si-implanted SiO2 films.
Journal: TechConnect Briefs
Volume: 3, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3
Published: May 8, 2005
Pages: 142 - 145
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topics: Carbon Nano Structures & Devices, Nanoelectronics