Gadgil V.J.
Mesa+ Institute for Nanotechnology, NL
Keywords: patterning, redeposition, waveguides
Recently FIB is increasingly being used for fabrication of nanosturctures and rapid prototyping. In the area of optical sciences, FIB is used for fabrication of 2D and 3D photonic devices. One of the problems in patterning is the redeposition. FIB provides control of the Ga beam and parameters such as scan direction, spot overlap, dwell time can be controlled. With new developments, it is also possible to blank the beam between two features to be milled. When milling a nano structure, it is critical to choose the right parameters. So far no mathematical model is available which deals with the redeposition. In this paper the effect of milling parameters on the redeposition is evaluated. Cross sections have been made to characterise the milled features. Results of nano structures fabricated with FIB are presented. Strategies for selection of parameters leading to optimum resolution of the intended structures is discussed.
Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics
Published: May 3, 2009
Pages: 37 - 40
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4398-1782-7