The first Italian micro exposure tool for EUV lithography: design guidelines and experimental results

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The first Italian Micro Exposure Tool (MET) for EUV lithography has been developed at the ENEA Research Laboratories in Frascati (Italy). In spite of the very low cost of the Schwarzschild optics, the specific design of the low vibration board and the innovative alignment technique (a modified Foucault technique) applied to the Schwarzschild optics allowed the achievement of a resolution better than 100 nm on a wafer coated with a PMMA photoresist

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics
Published: May 3, 2009
Pages: 33 - 36
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4398-1782-7