Solution Growth of Nanostructured Ceramic Films


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Low-temperature processing that can lead to the development of highly-functional, strain-tolerant ceramic films will offer innovative solutions for the use of ceramic thin films and coatings. Current developments in organic and flexible electronics make the low-temperature and low-cost ceramic processing even more valuable. One achievable way of processing ceramic films at low temperatures (<90˚C) is to take advantage of in-situ precipitated nanoparticles and nanostructures grown from aqueous solution. In our research efforts, we have developed a series of solution-based processing protocols that can provide a means of precisely controlling hydrolysis of metal ions in aqueous solution. Especially, this low temperature processing has shown versatility to generate various nanostructures with the aid of a seed layer and a patterned mask. The growth of low dimensional nanostructures (1-D or 2-D) in fact provides a possible way to enhance the crystallinity of the solution-prepared films that can ultimately benefit many applications such as photoelectrochemical cells and microdevices. We have thus far processed various oxide systems for barrier coatings (ZrO2, TiO2, SiO2), high-k dielectrics (TiO2, BaTiO3), engineered photoanodes for dye-sensitized solar cells (TiO2, ZnO), and low-k dielectric films (SiO2). These films can be deposited on flexible as well as rigid substrates including metallic surfaces.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2012: Advanced Materials, CNTs, Particles, Films and Composites (Volume 1)
Published: June 18, 2012
Pages: 660 - 663
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Materials for Engineering Applications, Coatings, Surfaces & Membranes
ISBN: 978-1-4665-6274-5