A novel simple method to fabricate high-density and large-area polymer nanopillars on silicon wafer. This method is versatile and can be applied to pattern a wide variety of polymer thin film materials with various proprieties such as electronic conductivity, photo conductivity and photo resist. The as-prepared pattern also has great potential application as template for the fabrication of nanoarchitecture materials.
Journal: TechConnect Briefs
Volume: 1, Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 1
Published: May 7, 2006
Pages: 256 - 257
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Materials for Engineering Applications, Coatings, Surfaces & Membranes