We characterize and measure the pre-released residual stress levels in polysilicon Micro-Electro-Mechanical Systems (MEMS) microbridges using micro-Raman spectroscopy. Raman spectroscopy is nondestructive, fast, and provides the potential for in situ stress monitoring during fabrication. Residual stress from the deposition process can have profound affects on the functionality and reliability of MEMS devices. Several post-fabrication processes are available (ion implantation, diffusion, and anneals) which can in°uence the residual stress in thin films. We performed a series of phosphorous implants to quantify the in°uence of doping and anneals on the residual stress levels in MEMS devices. This experiment demonstrates the effective use of Raman spectroscopy to monitor and provide information to help control or in°uence the residual stress in MEMS structures [1-4].
Journal: TechConnect Briefs
Volume: 1, Technical Proceedings of the 2002 International Conference on Modeling and Simulation of Microsystems
Published: April 22, 2002
Pages: 314 - 317
Industry sector: Sensors, MEMS, Electronics
Topic: MEMS & NEMS Devices, Modeling & Applications