Vasenkov A.V., Kolobov V.I.
CFD Research Corporation, US
Keywords: chemical vapor deposition, multi-scale computational framework, multi-wall, plasma, single-wall carbon nanotubes
Multi-Scale Computational Framework (MSCF) has been recently developed for nanostructured materials’ fabrication. This framework integrates a Computational Fluid Dynamic solver for computing reactor scale process, a Kinetic Monte Carlo simulator for the growth of nanostructured material, and an Molecular Dynamic software for computing rates of self-assembly processes. In this study, the MSCF was used to investigate the growth of carbon nanotubes (CNT) in a C2H2/H2 inductively coupled plasma systems. It was found that MSCF is capable of predicting paths for delivering carbon onto catalyst/CNT interface and formation of single wall or multi-wall CNTs depending on the shape of catalyst. The differences in the growth of CNTs in the plasma-assisted and vapor deposition systems are discussed.
Journal: TechConnect Briefs
Volume: 1, Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 1
Published: May 7, 2006
Pages: 617 - 620
Industry sector: Advanced Materials & Manufacturing
Topic: Informatics, Modeling & Simulation
ISBN: 0-9767985-6-5