In addition to the overall range of circuit characteristics expected from process variation the circuit designer needs to know how closely different circuit element will track one another. We describe a new methodology for modeling correlation between the chip mean variation different design FET and between different FET instances on a single chip. In addition it enables modeling the impact of circuit design choices on FET and circuit tracking.
Journal: TechConnect Briefs
Volume: Technical Proceedings of the 2005 Workshop on Compact Modeling
Published: May 8, 2005
Pages: 87 - 92
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topics: Nanoparticle Synthesis & Applications