Growth and Engineering of High Aspect-Ratio AAO Templates Integrated on Silicon Substrates

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We have developed a CMOS-compatible process for manufacturing nanowires directly on silicon (or other) substrates. This process removes some of the steps for conventional nanowire manufacture. The result are highly-ordered, high aspect-ratio nanowires for use in a variety of applications (we are concentrating on cathodes for rechargeable lithium ion batteries).

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Journal: TechConnect Briefs
Volume: 4, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
Published: May 20, 2007
Pages: 514 - 515
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Manufacturing, Nanoelectronics
ISBN: 1-4200-6376-6