Feedback Process Control for Nano-manufacturing of Semi-conductor Circuits


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We develop a feedback process control to realize 3-D circuits with a 2 to 4 nanometer footprint, using a heavily modified ink-jet based nano-manufacturing facility that includes actuator controls driven by pulsed femto lasers. At this footprint level, quantum effects are significant. Our technology for quantizing the design of a digital circuit into a 3-D implementation using master equation models is based on a quantized Hamiltonian that is tracked by the Hamiltonian of the printer to deploy the circuit design. We develop a quantum hybrid controller for manufacturing processes at the mesoscopic and quantum levels that includes interdependent multi-stage processes (e.g., quantum lithography, molecular epitaxial deposition, vertical dots, quantum wells, quantum wires, etc.). The quantum hybrid controller will be able to transform a desired circuit (expressed in logic and continuous rules) into manufacturing processes that will realize the nano-circuit and achieve performance criteria (such as maximize yield, maximize signal-to-noise ratio, minimize energy consumption, minimize dissipation, etc.). The proposed system will include a language for the rules that describe the specifications of the circuit, an interface with the manufacturing processes to monitor and prescribe the sequencing, and a design dashboard. The quantum hybrid controller works with Hamiltonian operators to represent the system to achieve overall manufacturing synchronization and control. The quantum hybrid controller will enable automation of nano-manufacturing of nano-circuits.

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Journal: TechConnect Briefs
Volume: 1, Advanced Materials: TechConnect Briefs 2017
Published: May 14, 2017
Pages: 379 - 382
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 978-0-9975117-8-9