Effects of Solvents on Dissolution of Photoresist in Parylene Microchannels

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This paper presents a detailed study for the effects of different types of solvents on dissolution of photoresist inside the parylene micro-channels, for the first time. Experimental results indicate that photoresist dissolution in dipolar aprotic solvents is much faster than the other types of solvents. This finding can be used to select alternative chemicals for stripping encapsulated photoresist.

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Journal: TechConnect Briefs
Volume: 2, Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational (Volume 2)
Published: June 18, 2012
Pages: 372 - 375
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topics: Micro & Bio Fluidics, Lab-on-Chip
ISBN: 978-1-4665-6275-2