Nassar R., Dai W., Zhang C., Lan H., Maxwell J.
Louisiana Tech University, US
Keywords: chemical vapor deposition, mathematical model
Laser chemical vapor deposition is a free form technique capable of producing high aspect ratio microstructures of arbitrary shape. The process does not yet have a high resolution required for microfabrication. For this study, we develop a mathematical model that can be used for predicting the scanning pattern of the laser beam on the surface of deposit in order to produce a microstructure with the desired geometry. We demonstrate the applicability of the model by simulating the deposition of a concave microlens using nickel on a graphite substrate.
Journal: TechConnect Briefs
Volume: Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
Published: March 27, 2000
Pages: 517 - 519
Industry sector: Sensors, MEMS, Electronics
Topic: Modeling & Simulation of Microsystems
ISBN: 0-9666135-7-0