The Patterning of Sub-500 nm Inorganic Structures for Hybrid Photovoltaics
Hampton M.J., Williams S.S., Retterer S.T., Templeton J.L., Samulski E.T., DeSimone J.M., The University of North Carolina at Chapel Hill, US
The Pattern Replication In Non-wetting Templates (PRINT) technique has been extended to patterning of isolated features as well as embossed films of sub-500 nm “hard” inorganic oxides and nanocrystalline semiconductors including TiO2, SnO2, ZnO, ITO, [...]