The Pattern Replication In Non-wetting Templates (PRINT) technique has been extended to patterning of isolated features as well as embossed films of sub-500 nm “hard” inorganic oxides and nanocrystalline semiconductors including TiO2, SnO2, ZnO, ITO, BaTiO3, and CdSe. The low surface energy, chemically resistant, air permeable elastomeric perflouropolyether (PFPE) based molds allow for numerous materials to be patterned on a variety of substrates including glass and transparent conductive oxides for a wide range of electronic and optical applications. PRINT is a unique route that provides for (1) large area arrays of isolated features with uniformity and precise control over shape and size (2) the patterning of materials with large aspect ratios (3) layer by layer deposition without destruction of the first layer and (4) the patterning of an extensive array of materials with amenability to surface functionalization and (5) a cost effective fabrication process that is scalable for roll-to-roll manufacturing processes. We will additionally discuss pattern replication on the sub-100 nm scale for photovoltaic applications using line gratings fabricated with electron beam lithography.
Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics
Published: May 3, 2009
Pages: 566 - 569
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topicss: Nanoelectronics, Photonic Materials & Devices