sacrificial-etching – TechConnect Briefs

Fabrication of 20 nm Embedded Longitudinal Nanochannels Transferred from Metal Nanowire Patterns

Choi D.S., Yang E.H., Jet Propulsion Laboratory, US

The traditional electron beam lithography and more recently developed focused ion beam (FIB) milling/lithography techniques have been exploited for generating exposed nanometer-size nanochannels. An additional process step of sealing exposed nanochannels cant be avoided to [...]

Numerical Simulation for the Sacrificial Release of MEMS Square Diaphragms

Li W.J., Liu J., Shih J.C., Mai J.D., Ho C-M., Liu J., Tai Y-C., UC-Los Angeles, US

Chemical etching of sacrifeial layers is a widely used technique in surface micromachining Etch rate prediction of the sacrif cial layer in an etchant is critical for optimizing a giving fabrication process. This paper presents [...]