process – TechConnect Briefs

Fully Integrated Embroidery Process for Smart Textiles

Trindade I.G., Spranger P., Martins F., Miguel R., Pereira M., Santos Silva M., Universidade da Beira Interior, PT

In this article, a compact textile system produced with a single embroidery digital machine and high design and integration versatility is presented. Clothing integrating textile electrodes made by seamless knitting has been proposed to monitor [...]

A visual approach on MEMS process modeling using device cross-sections

Schmidt T., Mielke M., Hahn K., Ortloff D., Popp J., Brueck R., University of Siegen, DE

With MEMS entering fast moving consumer markets the need for more efficient design concepts becomes apparent. A technology centered approach where a product is designed around a highly specialized and optimized technology cannot cope with [...]

Synthesis of Nanopowders and Their Production at the Industrial Scale Using the Inductively-Coupled Plasma Technology

Dolbec R., Bolduc M., Fan X., Guo J., Jurewicz J., Xue S., Boulos M., Tekna Plasma Systems Inc., CA

The increasing demand for nanopowders (particles size

A new system of composites: MWNT-mullite

Wang J., Kou H.M., Xiang C.S., Pan Y.B., Guo J.K., Shanghai Institute of Ceramics, Chinese Academy of Sciences., CN

Carbon Nanotubes (CNTs) are attracting increasing interest as constituents of composite materials for a wide range of applications. MWNT (multi-walled CNT)-ceramics composites are in the beginning of research. The mechanical properties of MWNTs-SiO2 composites were [...]

A Physical Compact MOSFET Mobility Model Including Accurate Calculation of Saturation Surface Potential

Benson J., D’Halleweyn N.V., Mistry K., Redman-White W., University of Southampton, UK

This paper describes a MOSFET vertical mobility model that has been implemented in a surface potential based compact model [1]. The main scattering mechanisms (surface roughness, phonon, and Coulomb) are accounted for using an expression [...]

Introducing Monte Carlo Diffusion Simulation into TCAD tools

Strecker N., Moroz V., Jaraiz M., Avant!, US

Advantages and disadvantages of the alternative approaches to the dopant diffusion simulation are discussed. Complementary use of the Monte Carlo and continuum diffusion models is suggested. Application of the integrated commercially available process simulation tools [...]

Introducing Monte Carlo Diffusion Simulation into TCAD tools

Strecker N., Moroz V., Jaraiz M., Avant!, US

Advantages and disadvantages of the alternative approaches to the dopant diffusion simulation are discussed. Complementary use of the Monte Carlo and continuum diffusion models is suggested. Application of the integrated commercially available process simulation tools [...]

Rational RSM Models for Device Characteristics as Functions of Process Parameters

Granik Y., Moroz V., PDF Solutions, Inc., US

Conventional polynomial Response Surface Methodology (RSM) fails to provide oscillation-free analytical models for some device data with singularity like subthreshold slope vs threshold adjustment dose, poly gate length vs stepper defocus, etc. New type of [...]