New Properties and New Challenges in MOS Compact Modeling
Zhou X., See G.H., Zhu G., Zhu Z., Zhu G., Zhu Z., Lin S., Wei C., Srinivas A., Zhang J., Nanyang Technological University, SG
As bulk-MOS technology is approaching its fundamental limit, non-classical devices such as multiple-gate (MG) and silicon-nanowire (SiNW) transistors emerge as promising candidates for future generation device building blocks. This trend poses new challenges in developing [...]