fringing electric field – TechConnect Briefs

Novel FD SOI Devices Structure for Low Standby Power Applications

Ma M-W, Chao T-S., Kao K-S, Huang J-S, Lei T-F, National Chiao Tung University, TW

In this paper, fully depleted (FD) SOI devices with S/D extension shift and high-k offset spacer were investigated in detail. The results show that the S/D extension shift can decrease Ioff significantly to reduce standby [...]

Novel FD SOI Devices Structure for Low Standby Power Applications

Ma M-W, Chao T-S., Kao K-S, Huang J-S, Lei T-F, National Chiao Tung University, TW

In this paper, fully depleted (FD) SOI devices with S/D extension shift and high-k offset spacer were investigated in detail. The results show that the S/D extension shift can decrease Ioff significantly to reduce standby [...]

Impacts of High-k Offset Spacer on 65-nm Node SOI Devices

Ma M-W, Chao T-S., Kao K-S, Huang J-S, Lei T-F, National Chiao Tung University, TW

In this paper, the 65-nm node SOI devices with high-k offset spacer was investigated. Calculated results show that the high-k offset spacer can effectively increase Ion and reduce Ioff due to the high vertical fringing [...]