bulk etching – TechConnect Briefs

Self-Adapting Vertices for Mask-Layout Synthesis

Lee C.-Y., Antonsson E.K., California Institute of Technology, US

An efficient procedure for synthesizing MEMS mask-layouts for a desired 3-D shape is discussed. This method can greatly reduce the number of design and prototype iterations required to produce a desired device. The method is [...]

Design of Compensation Structures for Anisotropic Etching

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask [...]

Surface Reconstruction of Etched Contours

Lee C.-Y., Antonsson E.K., California Institute of Technology, US

Previously, a computationally efficient and geometrically accurate etching simulation was developed to compute con-tours of constant depth at different time steps [1]. Experi-mental verification of this early work has been established [2]. However, contours are [...]

Computer Aided Mask-Layout for Bulk Etch Fabrication

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

This paper presents a method to synthesize the mask layout geometry for a MEMS wet etching process. Given a desired part geometry, the method determines a candidate mask geometry that will etch to the final [...]