anisotropic etching – TechConnect Briefs

Silicon MEMS for Photonic Bandgap Devices

Yeatman E.M., Lipson A., Imperial College London, UK

Photonic Bandgap (PBG) devices have been widely investigated because of their capabilities for manipulating light within highly constrained dimensions. Many PBG devices have been fabricated in III-V semiconductors to take advantage of their active optoelectronic [...]

Design of Compensation Structures for Anisotropic Etching

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask [...]

Computer Aided Mask-Layout for Bulk Etch Fabrication

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

This paper presents a method to synthesize the mask layout geometry for a MEMS wet etching process. Given a desired part geometry, the method determines a candidate mask geometry that will etch to the final [...]