Nanoscale fast Ge diffusion in laser irradiated SiGe thin films
Teodorescu V.S., Ghica C., Maraloiu A.V., Lepadatu A.M., Stavarache I., Ciurea M.L., Scarisoreanu N.D., Andrei A., Dinescu M., National Institute for Materials Physics, RO
We report the presence of a fast Ge diffusion effect produced during laser crystallization of Si0.45Ge0.55 films deposited by magnetron sputtering on Si(100) substrates. The laser irradiation was performed using the 265 nm wavelength radiation [...]