Fabrication and characterization of nano-structured ferromagnetic Ti1-xFexO2 thin films
Apetrei R., Negrila C., Macovei D., Dascaleanu V., Teodorescu C.-M., Luca D., Alexandru Ioan Cuza University, RO
Ti1-xFexO2, 300 nm thin films with x ranging between 0.0 and 0.6, have been fabricated by RF magnetron sputtering. Specimen characterization was done by XPS, AFM, XRD,UV-Vis spectrometry, MOKE, and XANES/EXAFS techniques. The AFM and [...]