Lewis S. – TechConnect Briefs

Characterization of an ultra high aspect ratio electron beam resist for nano-lithography

Lewis S., Jeanmaire D., Haynes V., Piccirillo L., The University of Manchester, UK

The performance of a new electron beam resist called SM20L-15 for use in electron beam lithography has been investigated. It was found that the clearing dose of this resist was 1025uC/cm2. The result is that [...]

Low cost PMMA based photo-masks for 3D grey scale micro-structuring applications

Lewis S., Wheeler-Jones R., Perks R., Haynes V., Cardiff university, UK

Grey scale lithography is a useful technique for the fabrication of three dimensional microstructures. Dose dependent positive resist materials are well suited to this application; subsequent dry etching through a suitably patterned etch mask can [...]