Nanowire formation for Single Electron Transistor using SEM Based Electron Beam Lithography (EBL) Technique: Positive Tone Vs Negative Tone E-beam Resist
Nuzaihan M., Hashim U., Halim N.H.A., Bajuri S.N.M., Northern Malaysia University College of Engineering, MY
Experimental studies of nanowires formation are carried out. The nanowires are fabricated using Scanning Electron Microscope Based Electron Beam Lithography (EBL) Technique with critical dimensions in less than 100nm. In order to complete the design [...]