Ma K-S, Madou M., Jia G-Y, Xu Q., Zhou H., Wang C-L, Zoval J., Madou M.
University of California Irvine, US
Keywords: carbon NEMS, EBL, electron beam lithography, nano wires, SU8
We have demonstrated a technique to fabricate carbon nano wires of controllable dimension and location using a top-down methodology. The width and thickness of the wires are in the tens of nanometer range. Additionally, the technique is capable to produce conducting carbon nano wires with addressable positioning, controllable length, high aspect ratio (length vs width) and alignment. The addressable and patternable carbon nano wires we developed can be exploited in large-scale assembly to make highly integrated nano wire sensor arrays or electronic devices.
Journal: TechConnect Briefs
Volume: 2, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Published: May 8, 2005
Pages: 151 - 154
Industry sector: Advanced Materials & Manufacturing
Topic: Carbon Nano Structures & Devices
ISBN: 0-9767985-1-4