Wafer Fabrication Process Simulation Including Cost: Which Should be Used in an In-Line Wafer Inspection Strategy, High Sensitivity and High Cost Inspection Machine or Low Sensitivity and Low Cost Inspection Machine?

Nakamae K., Yamaji S., Fujioka H.
Osaka University, JP

Keywords: inspection process, particle, remedy, sampling inspection, wafer fabrication

By combing an event-driven simulation method including costs and a simple VLSI particle-induced yield predictor, we discuss that which should be used in an in-line wafer inspection strategy, a high sensitivity & high cost inspection machine or a low sensitivity & low cost inspection machine. Two segments of a DRAM fab line including the inspection and the defect sourcing stages are modeled. Simulated results show that setting an adequate wafer rejection condition and selecting a proper sampling plan obtain the minimum cost per chip regardless of the kind of inspection machine.

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Journal: TechConnect Briefs
Volume: Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
Published: March 27, 2000
Pages: 700 - 703
Industry sector: Sensors, MEMS, Electronics
Topic: Modeling & Simulation of Microsystems
ISBN: 0-9666135-7-0