Thin film solar cell based on microcrystalline nanostructure silicon grown in low temperature condition

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High quality microcrystalline silicon thin film grown by Hot-Wire Chemical Vapor Deposition(HWCVD) and subsequently manufactured solar cells are presented. Intrinsic layer photoconductivity data is provided for one of the film quality measures, and the result is about 3 times higher than previously reported best record. We propose two-step microcrystalline silicon film growth mechanism, in which silicon nanoparticles are formed in the gas phase and subsequently incorporated into a solid film on glass substrates.

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Journal: TechConnect Briefs
Volume: Technical Proceedings of the 2009 Clean Technology Conference and Trade Show
Published: May 3, 2009
Pages: 33 - 35
Industry sector: Energy & Sustainability
Topic: Solar Technologies
ISBN: 978-1-4398-1787-2