Thin film solar cell based on microcrystalline nanostructure silicon grown in low temperature condition

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High quality microcrystalline silicon thin film grown by Hot-Wire Chemical Vapor Deposition(HWCVD) and subsequently manufactured solar cells are presented. Intrinsic layer photoconductivity data is provided for one of the film quality measures, and the result is about 3 times higher than previously reported best record. We propose two-step microcrystalline silicon film growth mechanism, in which silicon nanoparticles are formed in the gas phase and subsequently incorporated into a solid film on glass substrates.

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Journal: TechConnect Briefs
Volume: 3, Nanotechnology 2009: Biofuels, Renewable Energy, Coatings, Fluidics and Compact Modeling
Published: May 3, 2009
Pages: 134 - 136
Industry sector: Energy & Sustainability
Topics: Solar Technologies
ISBN: 978-1-4398-1784-1