In this work we have analyzed the evolution of surfaces roughness coated with DLC. This study explores substrates with initial roughness (rms) between hundreds of nanometers and just few nanometers. We have used three substrates, two of policrystalline diamond films, with roughness about hundreds of nanometers, and one of silicon etched with acid, with roughness about few nanometers. Our intention is to have substrates with three different roughnesses. Each sample was characterized by atomic force microscopy (AFM). The substrates were cut into pieces and each piece was coated with different DLC thicknesses. Finally, the DLC films on the samples were characterized by AFM. The surface roughness shifts as a function of the DLC thickness coating have been obtained. For the substrates with original roughness 393 and 278 nm, the roughness shift increased with the DLC thickness up to a maximum value and then decreased. For the substrate with original roughness around 4 nm, the roughness shift oscillates with no systematic tendency to decrease or increase. These results are interpreted using some of our previous papers and taking into account the dynamic growth of thin films.
Journal: TechConnect Briefs
Volume: 2, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Published: May 8, 2005
Pages: 358 - 360
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Materials for Engineering Applications, Coatings, Surfaces & Membranes