Sub-wavelength metal nanostructure fabrication by parallel dip-pen nanolithography

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Metal nanostructures in sub-wavelength scale have attracted interests in materials engineering and optics research. Metal nanostructures in sub-wavelength scale have been used as plasmonic diffraction gratings and negative index metamaterials. E-beam lithography has been commonly used to fabricate those metal nanostructures; however, e-beam lithography has limitation in scale-up of nanostructure fabrication and is expensive. In this study, the low cost and convenient scale-up fabrication method for metal nanostructures using Dip Pen Nanolithography® (DPN®) is demonstrated. DPN was used to deposit alkanethiol patterns, which were then used as can be used as etch resists for top-down nanofabrication processes to generate Au nano-features. As a proof of concept, arrays of three different designed double-ring Split-Ring Resonators (SRRs) were fabricated by 1D DPN printing.

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Journal: TechConnect Briefs
Volume: 2, Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
Published: June 13, 2011
Pages: 92 - 95
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Materials for Engineering Applications
ISBN: 978-1-4398-7139-3