Sefa-Ntiri B., Docker P., Ward M.C., Prewett P.D.
University of Birmingham, UK
Keywords: ENFOL, nano-lithography
Evanescent Near-Field Optical Lithography (ENFOL) is an inexpensive route to nanolithography, overcoming the diffraction limitations of conventional optical technology. This paper details modelling work developed by the authors, to produce a predictive model that can be used by future workers wishing to use ENFOL. This work was carried out using the commercial package FEMLABTM. The model provides a tool for developing prototype low-cost, flexible and high-performance optical lithographic masks for the fabrication of diffraction-limited high resolution features, in a “virtual testing” capability. Techniques such as ENFOL are becoming particularly attractive as the need for the miniaturization of devices and therefore the increased density of devices that will fit on a single wafer continues to grow. Where high density lowers packaging costs, which are a significant factor in the cost of photonic and optoelectronic products, for example.
Journal: TechConnect Briefs
Volume: 3, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3
Published: May 8, 2005
Pages: 297 - 300
Industry sector: Sensors, MEMS, Electronics
Topic: Photonic Materials & Devices
ISBN: 0-9767985-2-2