Silicon on ceramics – a new concept for micro-nano-integration on wafer level

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A new integration concept for silicon devices to ceramic substrates based on a new bonding technique between nano-scaled, modified Black Silicon and an adapted, unfired LTCC substrate is presented. The novel technique enables to combine advantages of silicon and ceramic technology, especially electrical and fluidic interconnects from nm- to mm-scale. Current bonding concepts of silicon on ceramics need joining materials like solders, adhesives or glass frits. Alternatively, silicon components can be mounted to a TCE-matched and fired LTCC by anodic bonding, which requires costly surface preparation by polishing. This step is eliminated by the use of the new technique. During a standard lamination process, a self-organized, nano-structured silicon surface is joined with the green ceramic body. Pressure assisted sintering allows the co-firing of the composite. Dense contact between the Black Silicon surface and the ceramic, leading to a maximum average bonding strengths of 1775 N/cm, is achieved by optimization of the nano-interface and the lamination procedure. First leak-tightness measurements show leak rates up to 1.9 10-8 mbar l/s. Electrical interconnects between ceramic body and silicon have been realised by means of metalized BSi penetrating into LTCC conductors The new integration concept has been demonstrated by a fluidic chip cooling system.

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Journal: TechConnect Briefs
Volume: 3, Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation – Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3
Published: June 1, 2008
Pages: 157 - 160
Industry sector: Sensors, MEMS, Electronics
Topic: Sensors - Chemical, Physical & Bio
ISBN: 978-1-4200-8505-1