Scalable Production of Stabilized Catalysts via Atomic Layer Deposition

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We report the use of several nanostructuring concepts using Atomic Layer Deposition (ALD) that coupled with porosity induction via heat treatment resulted to controllably accessible model catalysts. This enables more active, selective and stable catalysts. The process versatility lies on the fact that it can be used in a scalable way to fabricate new catalysts but also improve the performance of conventional catalysts. When carried out in a so-called fluidized bed, ALD is an attractive way of treating a large amount of particles as substrate. In such a system, the particles are suspended in an upward gas flow. Recently, we have demonstrated a new reactor concept that spatially separates the administering of the reactants. In this reactor, support particles are pneumatically transported and ALD reactants are administered along the way, allowing continuous production of catalysts. We will discuss both scalable approaches for making stable catalysts.

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Journal: TechConnect Briefs
Volume: 2, Materials for Energy, Efficiency and Sustainability: TechConnect Briefs 2015
Published: June 14, 2015
Pages: 120 - 123
Industry sector: Advanced Materials & Manufacturing
Topics: Catalysis
ISBN: 978-1-4987-4728-8